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Stage 1:
The by far simplest superconducting thin film process we can be able to do in Mor Di, depositing Nb and SiO2 could be preformed in two of our 3 E-Beam Crucibles, 

To make things dead simple:

  • Lithography:
    • Nah, PL needs photoresist, etching and exposure. 
    • Solution: Use Made-in-Jaina- laser cut PCB stencils. Extremely cheap, readily available and 
    • Issues: while the Terrible mask alignment can be helped, we're talking >100um feature size. Extremely shitty, but cheap and 'eh'y enough for now. 
  •  Deposition: All preformed with E-Beam system in mor di. 
    • All materials in question are easily deposited with an electron beam
    • Substrate movement only required for 


This is a proof of concept that we at OV can not only do basic deposition, but microcircuit fabrication and superconductor experimentation. I (HT) do not know of any simpler process we might use to accomplish this, the costs involved are minimal and virtually no additional equipment is required. 
It will however be potato-quality and cause nanolab engineers to roll of their chairs laughing. 



Stage 2: 
Proper lithography, process control and maybe NbN- sputtering to better layer adhesion and superconducting properties. 

Will probably need to access nanolab and have some backing from Timini Labs or a technician, but not an unrealistic step up. 



Stage 3: Maybe own lithography and reactive ion beam etching?




Materials:
Stage 1: Shitty and bad:

Stage 2: Better, photolithography from nanolab?

  • CF4 (R13 

Stage 3: Sputtered NbN and maybe own lithography?

  • CF4 (R13 


Gear:






Method for preparing soldered pad connections to Nb- Pads with indium solder & Low temp soldering iron:

https://www.sciencedirect.com/science/article/pii/001122759592884U/pdf?md5=b061acc3d6cb04d9d46e2f3943ea614b&pid=1-s2.0-001122759592884U-main.pdf&_valck=1

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